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原子力顯微鏡AFM探針 NanoSensors（二）
| 型號 | 盒(根) | 產(chǎn)品描述 |
| SSS-SEIH | 10 | Silicon cantilever for non-contact/tapping -mode,special type A, with SUPERSHARPSILICON tip |
| 20 | ||
| 50 | ||
| SSS-SEIHR | 10 | Silicon cantilever for non-contact/tapping -mode,special type A, with SUPERSHARPSILICON tip detector side : Al-coating |
| 20 | ||
| 50 | ||
| qp-CONT | 10 | 生物探針，懸臂梁: 共振頻率11kHz 力常數(shù) 0.01 N/m; 應(yīng)用范圍：生物探針、液體探針；優(yōu)勢：力常數(shù)和共振頻率波動范圍小，特別適用于的定量納米力學(xué)研究和生物測試 |
| 20 | ||
| 50 | ||
| qp-SCONT | 10 | 生物探針，懸臂梁: 共振頻率11kHz 力常數(shù) 0.01 N/m; 應(yīng)用范圍：生物探針、液體探針；優(yōu)勢：力常數(shù)和共振頻率波動范圍小，特別適用于的定量納米力學(xué)研究和生物測試 |
| 20 | ||
| 50 | ||
| PtSi-CONT | 10 | 導(dǎo)電探針，鍍層: 鉑硅； 比常規(guī)導(dǎo)電探針更耐磨，電學(xué)信號更長久，重復(fù)性好、分辨率高。應(yīng)用范圍：導(dǎo)電探針 |
| 20 | ||
| 50 | ||
| ATEC-CONT | 10 | 接觸模式硅探針 |
| 20 | ||
| 50 | ||
| ATEC-CONTPt | 10 | 接觸模式硅探針，鍍層：Pt/Ir |
| 20 | ||
| 50 | ||
| ATEC-CONTAu | 10 | 接觸模式探針，臂梁及針尖鍍層：鍍金 |
| ppp-CONT | 10 | 接觸模式探針， |
| 20 | ||
| 50 | ||
| PPP-CONT-W | 380 | |
| PPP-CONTR | 10 | 接觸模式探針，鍍層：Al |
| 20 | ||
| 50 | ||
| PPP-CONTR-W | 380 | |
| PPP-XYCONTR | 10 | 接觸模式探針，鍍層：Al ,XY-auto aligment |
| 20 | ||
| 50 | ||
| PPP-CONTPt | 10 | Silicon cantilever for contact mode, detector side :Pt/Ir-coating ,tip side : Pt/Ir-coating |
| 20 | ||
| 50 | ||
| PPP-CONTPt-W | 380 | |
| PPP-CONTAu | 10 | Silicon cantilever for contact mode, detector and tip side : Au-coating |
| PPP-CONTAuD | 10 | Silicon cantilever for contact mode, detector side : Au-coating |
| DT-CONTR | 10 | 金剛石探針，接觸模式，鍍層：Al |
| 20 | ||
| 50 | ||
| CDT-CONTR | 10 | 導(dǎo)電金剛石探針，接觸模式，鍍層：Al |
| 20 | ||
| 50 | ||
| PPP-ZEILR | 10 | silicon cantilever for contact mode, special type, detector side :Al-coating |
| 20 | ||
| 50 | ||
| PPP-ZEILR-W | 380 | |
| PPP-RT-CONTR | 10 | silicon cantilever for contact mode, tip rotated by 180°,detector side :Al-coating |
| 20 | ||
| 50 | ||
| PL2-CONT | 10 | Silicon-SPM-Probe with plateau tip, silicon cantilever for contact mode, |
| PL2-CONTR | 10 | Silicon-SPM-Probe with plateau tip, silicon cantilever for contact mode, detector side: Al-coating |
| TL-CONT | 10 | Tipless silicon cantilever based on POINTPROBE technology |
| 20 | ||
| 50 | ||
| PPP-CONTSC | 10 | silicon cantilever for contact mode, short cantilever |
| 20 | ||
| 50 | ||
| PPP-CONTSCR | 10 | silicon cantilever for contact mode, short cantilever, detector side :Al-coating |
| 20 | ||
| 50 | ||
| PPP-CONTSCR-W | 380 | |
| PPP-CONTSCPt | 10 | silicon cantilever for contact mode, short cantilever, detector side :Pt/Ir-coating |
| 20 | ||
| 50 | ||
| PPP-CONTSCAu | 10 | silicon cantilever for contact mode, short cantilever, detector and tip side :Au-coating |
| PPP-CONTSCAuD | 10 | silicon cantilever for contact mode, short cantilever, detector side :Au-coating |
| PtSi-FM | 10 | 導(dǎo)電探針，鍍層: 鉑硅； 比常規(guī)導(dǎo)電探針更耐磨，電學(xué)信號更長久，重復(fù)性好、分辨率高。應(yīng)用范圍：導(dǎo)電探針 |
| 20 | ||
| 50 | ||
| ATEC-FM | 10 | 軟輕敲探針，鍍層: 無； 針尖可視的探針，可應(yīng)用到對于那些針尖需要被精確定位或必須針尖可見的應(yīng)用（例如，用于納米操作）來說，ATEC是必然的。由于其超小的半錐角，ATEC系列產(chǎn)品在陡峭的小尺寸圖案樣品測量中表現(xiàn)出很好的性能. Silicon cantilever for force modulation mode, |
| 20 | ||
| 50 | ||
| ATEC-EFM | 10 | Silicon cantilever for force modulation mode, detector and tip side:Pt/Ir-coating |
| 20 | ||
| 50 | ||
| ATEC-FMAu | 10 | Silicon cantilever for force modulation mode, detector and tip side:Au-coating |
| PPP-LFMR | 10 | Silicon cantilever for lateral/friction force microscopy,detector side: Al-coating |
| 20 | ||
| 50 | ||
| PPP-LFMR-W | 380 | |
| PPP-FM | 10 | Silicon cantilever for force modulation mode, |
| 20 | ||
| 50 | ||
| PPP-FM-W | 380 | |
| PPP-FMR | 10 | Silicon cantilever for force modulation mode, detector side:Al-coating |
| 20 | ||
| 50 | ||
| PPP-FMR-W | 380 | |
| PPP-FMAu | 10 | Silicon cantilever for force modulation mode, detector and tip side: Au-coating |
| PPP-FMAuD | 10 | Silicon cantilever for force modulation mode, detector side: Au-coating |
| PPP-QFMR | 10 | Silicon cantilever for force modulation mode, High quality factor for UHV applications, detector side: Al-coating |
| PPP-RT-FMR | 10 | Silicon cantilever for force modulation mode, Tip rotated by 180°,detector side: Al-coating |
| 20 | ||
| 50 | ||
| PL2-FM | 10 | Silicon-SPM-Probe with plateau tip, Silicon cantilever for force modulation mode, |
| PL2-FMR | 10 | Silicon-SPM-Probe with plateau tip, Silicon cantilever for force modulation mode, detector side:Al-coating |
| TL-FM | 10 | Tipless silicon cantilever based on POINTPROBE technology |
| 20 | ||
| 50 | ||
| SSS-FM | 10 | Silicon cantilever for force modulation mode, With SUPERSHARPSILICON tip |
| 20 | ||
| 50 | ||
| SSS-FMR | 10 | Silicon cantilever for force modulation mode, With SUPERSHARPSILICON tip, detector side:Al-coating |
| 20 | ||
| 50 | ||
| DT-FMR | 10 | 金剛石探針，Silicon cantilever for force modulation mode, 鍍層：Al |
| 20 | ||
| 50 | ||
| CDT-FMR | 10 | 導(dǎo)電金剛石探針，Silicon cantilever for force modulation mode, 鍍層：Al |
| 20 | ||
| 50 | ||
| PPP-EFM | 10 | Silicon cantilever for electrostatic force Microscopy, detector side:Pt/Ir-coating , tip side: Pt/Ir-coating |
| 20 | ||
| 50 | ||
| PPP-EFM-W | 370 | |
| PPP-MFMR | 10 | Silicon cantilever for Magnetic force Microscopy, detector side:Al-coating , tip side: hard magnetic coating |
| 20 | ||
| 50 | ||
| PPP-MFMR-W | 370 | |
| PPP-LM-MFMR | 10 | Silicon cantilever for Magnetic force Microscopy, Low Moment ,detector side:Al-coating , tip side: hard magnetic coating |
| 20 | ||
| 50 | ||
| PPP-LC-MFMR | 10 | Silicon cantilever for Magnetic force Microscopy, Low Coercivity ,detector side:Al-coating , tip side: hard magnetic coating |
| 20 | ||
| 50 | ||
| PPP-QLC-MFMR | 10 | Silicon cantilever for Magnetic force Microscopy, Low Coercivity ,high quality factor for UHV applications,detector side:Al-coating , tip side: hard magnetic coating |
| SSS-MFMR | 10 | Silicon cantilever for high resolution Magnetic force Microscopy, detector side:Al-coating , tip side: hard magnetic coating |
| 20 | ||
| 50 | ||
| SSS-QMFMR | 10 | Silicon cantilever for Magnetic force Microscopy, ,high quality factor for UHV applications,detector side:Al-coating , tip side: hard magnetic coating |
| 2D200 | 1 | CALIBRATION STANDARD for x-y calibration of the scanning mechanism,lattice of inverted pyramids,200nm pitch |
| 2D300 | 1 | CALIBRATION STANDARD for x-y calibration of the scanning mechanism,lattice of inverted pyramids,300nm pitch |
| H8 | 1 | HEIGHT STANDARD for very precise z-calibration,nominal step height: 8nm |
| FLAT | 1 | FLATNESS STANDARD for analysis and correction of the scanner bow,smooth plane with a maximum peak to valley distance of 10nm on a 100x100u㎡ area |
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