Excellent Phase Contrast in the µ-Slide 4 well Ph+
一個開放的四孔培養(yǎng)載玻片，帶有一個特殊中間板，非常適用于相差和的熒光顯微鏡
整個培養(yǎng)孔具有優(yōu)秀的相差-沒有彎月面現(xiàn)象
一體化小室，既可用于細(xì)胞培養(yǎng)，也可用于顯微鏡成像
使用高分辨率顯微鏡可以通過玻璃片底部進(jìn)行樣品觀察
沒有蓋玻片，不會泄露，用于快速，簡單的免疫熒光。
應(yīng)用 ：
細(xì)胞培養(yǎng)以及細(xì)胞培養(yǎng)物的顯微鏡觀察。
轉(zhuǎn)染分析
活細(xì)胞和固定細(xì)胞的免疫熒光顯微鏡觀察
長時(shí)間段下活細(xì)胞成像
| 貨號 | 產(chǎn)品名稱 | 規(guī)格（個/盒） |
| 80446 | µ-Slide4孔Ph+腔室載玻片，ibiTreat底部處理 | 15 |
| 80442 | µ-Slide 4孔Ph+腔室載玻片，Collagen IV底部處理 | 15 |
| 80443 | µ-Slide 4孔Ph+腔室載玻片，F(xiàn)ibronectin底部處理 | 15 |
| 80444 | µ-Slide 4孔Ph+腔室載玻片，Poly-L-Lysine底部處理 | 15 |
| 80445 | µ-Slide 4孔Ph+腔室載玻片，Poly-D-Lysine底部處理 | 15 |
| 80441 | µ-Slide 4孔Ph+腔室載玻片，無包被 | 15 |
| 80447 | µ-Slide 4孔Ph+腔室載玻片，玻璃底 | 15 |
技術(shù)指標(biāo)：
| 孔數(shù)量 | 4 | 帶蓋子高度 | 10.8 mm |
| 孔尺寸大小 | 21.2 x 11.0 x 3.0 | 每孔生成面積 | 2.2 cm2 |
| 每孔體積 | 700 µl | 每孔生成面積 | 5.9 cm2 |
| 底部ibidi 標(biāo)準(zhǔn)底部 | |||
技術(shù)特點(diǎn)：
開放式，兩個獨(dú)立的培養(yǎng)孔載玻片
每個培養(yǎng)孔上的中間板可以避免彎液面形成
從兩側(cè)縫隙很容易加液，無氣泡形成，
適用于顯微鏡的優(yōu)秀光學(xué)成像特質(zhì)
兼容染色，固定
細(xì)胞粘附的表面Ibitreat
生物兼容性塑料生產(chǎn)，無膠水，不泄露
Phase contrast microscopy is the most commonly used, transmitted light technique in cell culture. When working with phase contrast microscopy, it is crucial to have the two phase rings adjusted to each other. In open wells, the meniscus at the air-water-interphase works like a lens that refracts the beam path. This miscalibrates the phase rings, leading to poor contrast in the microscopic image.
Working with the µ-Slide 4 well Ph+ diminishes the meniscus, so that the whole optical system is aligned, no matter which position of the well is being imaged.
Cross Section Through a Well of the µ-Slide 4 well Ph+ with a Transmitted Light Beam Path.
The illustration on the left shows the perturbing effect of a meniscus. Light is refracted on the air-water-interface, leading to poor contrast in microscopy. Only the small center part exhibits satisfying phase contrast.
Working with the µ-Slide 4 well Ph+ diminishes the meniscus and increases the area of nicely contrasted cells. This nice contrast is due to the parallel beam path that is created by the plate.
